Vol. 22, No. 1
from IUPAC-Sponsored Symposia
International Symposium on Plasma Chemistry (ISPC-14)
2-6 August 1999,
Prague, Czech Republic
This biennial symposium encompassed the whole area of plasma chemistry,
with topics ranging from the basic physics and chemistry of thermal
and low-pressure nonequilibrium (cold) plasmas to industrial processes,
processing techniques, and equipment. ISPC-14 included a Plasma Equipment
Exhibition and was preceded by a three-day Summer School on Plasma Chemistry
(29-31 July) and followed by a two-day Workshop on Industrial
Applications of Plasma Processing (6-7 August).
Of the 510 attendees at ISPC-14, 76 were Czech and 434 came from 42
other countries. The 553 contributions included 8 invited plenary lectures,
18 invited topical lectures, 158 oral presentations, and 369 posters.
The five-volume symposium proceedings contained 486 papers amounting
to 2 877 pages. Specific topics included basic physical and chemical
processes in plasmas, modeling and diagnostics of plasmas, plasma generation,
plasma-particle interaction, plasma-surface interaction,
plasma etching, plasma CVD, plasma synthesis, plasma spraying, plasma
metallurgy, environmental applications, and industrial applications.
The summer school attracted 33 participants to its course on low-pressure
nonequilibrium plasmas, and 29 people attended the course on thermal
plasmas. The workshop included a total of 12 lectures, with four each
on the topics of thermal plasmas, plasma surface processing, and plasma
Social events associated with ISPC-14 included a welcoming party on
Monday, a concert on Tuesday, tours and a visit to the Institute of
Plasma Physics on Wednesday, and a dinner on Thursday.
The next symposium in the series, ISPC-15, also with a summer school
and workshop, will be held in OrlÈans, France in July 2001.
IUPAC Physical Chemistry Division (I)
Subcommittee on Plasma Chemistry