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Pure Appl. Chem., Vol. 72, No. 11, pp. 2167-2175, 2000.

High-temperature chemical vapor deposition. An effective tool for the production of coatings*

G. Wahl1**, O. Stadel1, O. Gorbenko2, and A. Kaul2

1Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, Technische Universität Braunschweig, Bienroder Weg 53, D 38108 Braunschweig, Germany; 2Moscow State University, Chemistry Department, Moscow 119899, Russia

Abstract: Chemical vapor deposition (CVD) processes have a large throwing power and can operate at atmospheric pressure. Therefore, they are economical for many applications. High-temperature CVD processes give a good control of the crystal structure (e.g., epitaxial layers or other special layer structures) and support diffusion processes. The are used, for example, for the following deposition processes: 1) perovskites, 2) yttrium-stabilized ZrO2 layers as ion conductors or heat barrier coatings, 3) aluminide diffusion coatings in long tubes for corrosion protection, and 4) BN on fibers for fiber-reinforced materials. The special properties of the perovskite CVD are discussed in more detail. These processes are described for small- and large-scale applications. The CVD process is simulated by the computer code Fluent.

*Lectures from the 10th International Conference on High Temperature Materials Chemistry (HTMC-X), Jülich, Germany, 10-14 April 2000. Other presentations are published in this issue, pp. 2101-2186.
** Corresponding author

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