High-temperature chemical vapor deposition. An
effective tool for the production of coatings*
G. Wahl1**, O. Stadel1, O. Gorbenko2,
and A. Kaul2
Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, Technische
Universität Braunschweig, Bienroder Weg 53, D 38108 Braunschweig,
Germany; 2Moscow State University, Chemistry Department,
Moscow 119899, Russia
Abstract: Chemical vapor deposition (CVD) processes have a large
throwing power and can operate at atmospheric pressure. Therefore, they
are economical for many applications. High-temperature CVD processes
give a good control of the crystal structure (e.g., epitaxial layers
or other special layer structures) and support diffusion processes.
The are used, for example, for the following deposition processes: 1)
perovskites, 2) yttrium-stabilized ZrO2 layers as ion conductors
or heat barrier coatings, 3) aluminide diffusion coatings in long tubes
for corrosion protection, and 4) BN on fibers for fiber-reinforced materials.
The special properties of the perovskite CVD are discussed in more detail.
These processes are described for small- and large-scale applications.
The CVD process is simulated by the computer code Fluent.
*Lectures from the 10th International Conference
on High Temperature Materials Chemistry (HTMC-X), Jülich, Germany,
10-14 April 2000. Other presentations are published in this issue, pp.
** Corresponding author
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